Center for Narrow Bandgap Semiconductors
Wu BingbingAssistant Research

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Wu Bingbing

Assistant Research Fellow

Wu Bingbing@hnas.ac.cn

Wu Bingbing: Assistant Research Fellow, Micius Laboratory. The main research focuses on semiconductor materials, processes, devices, and related areas. Key research directions include: (1) Chemical mechanical polishing (CMP) and post-CMP cleaning for advanced semiconductor processes; (2) Optoelectronic devices based on two-dimensional (2D) semiconductors.

Education Background

09/2009~06/2013:  BA, School of Chemistry and Chemical Engineering, Shangqiu Normal University, China

09/2014~06/2017:  MA, School of Chemical and Material Engineering, Jingnan University, China

09/2017~06/2021:  PhD, School of Microelectronics, Fudan University, China

Work Experience

09/2021~06/2023:  China Electronic Technology Group Corporation 27th Research Institute

07/2023~08/2024:  Westlake University

09/2024~Present:   Micius Laboratory

Honors and Awards

Fudan University PhD Academic Scholarship (2018, 2019, 2020)

Publications and patents in the past five years

[1] B.B.Wu; H.M.Zheng; Y.Q.Ding; W.J.Liu; H.L.Lu; P.Zhou; L.Chen; Q.Q.Sun; S.J.Ding; David

W.Zhang ; Direct Growth of Al2O3 on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition, Nanoscale Research Letters, 2017, 12(1): 282-282

[2] Peng He; Bingbing Wu; Shuai Shao; Tong Teng; Peng Wang; Xin-Ping Qu ; Characterization of 1, 2, 4-Triazole as Corrosion Inhibitor for Chemical Mechanical Polishing of Cobalt in H2O2 Based Acid Slurry, ECS Journal of Solid State Science and Technology, 2019, 8(5): P3075-P3084

[3] Shuai Shao; Bingbing Wu; Peng Wang; Peng He; Xin-Ping Qu ; Investigation on inhibition of ruthenium corrosion by glycine in alkaline sodium hypochlorite based solution, Applied Surface Science, 2020, 506: 144976

[4] Bingbing Wu; Peng Wang; Yingjie Wang; Xin-Ping Qu; Baimei Tan; Satomi Hamada; Yutaka

Wada; Hirokuni Hiyama ; Removal of Nanoceria Abrasive Particles by Using Diluted SC1 and NonIonic Surfactant, ECS Journal of Solid State Science and Technology, 2021, 10(3): 034010

[5] Yingjie Wang; Bingbing Wu; Li-Na Qiu; Lianfeng Hu; Haijun Cheng; Xin-Ping Qu; Satomi

Hamada; Yutaka Wada; Hirokuni Hiyama ; Cleaning Nanoceria Particles by Diluted HNO3 with H2O2 Mixture (NPM) Solution at Different Temperatures, ECS Journal of Solid State Science and Technology, 2023, 12(1): 014001